| 標題: | 非晶態鎢摻雜氧化銦透明薄膜電晶體技術之研究 Study on Transparent Amorphous Tungsten Doped Indium Oxide Thin Film Transistors Technology |
| 作者: | 張志睿 Chang, Chih-Jui 劉柏村 Liu, Po-Tsun 光電工程研究所 |
| 關鍵字: | 鎢摻雜氧化銦;雙主動層結構;透明薄膜電晶體;顯示器;Tungsten Doped Indium Oxide;bi-layer structre;Thin Film Transistors;TFT-LCD |
| 公開日期: | 2015 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#GT070250519 http://hdl.handle.net/11536/126951 |
| 顯示於類別： | 畢業論文 |
- Stability study of indium tungsten oxide thin-film transistors annealed under various ambient conditions / Qu, Mingyue;Chang, Chih-Hsiang;Meng, Ting;Zhang, Qun;Liu, Po-Tsun
- 高效能氧化銦鎢薄膜電晶體元件研究與開發 / 張智翔;劉柏村;Chang, Chih-Hsiang;Liu, Po-Tsun
- 高效能低操作偏壓非晶氧化銦鎢薄膜電晶體之研究 / 張建民;劉柏村;Chang, Chien-Min;Liu, Po-Tsun
- 低溫非晶態鎢摻雜氧化銦薄膜電晶體技術之研究 / 陳柏文;劉柏村;Chen, Po-Wen;Liu, Po-Tsun
- Suppression of photo-bias induced instability for amorphous indium tungsten oxide thin film transistors with bi-layer structure / Liu, Po-Tsun;Chang, Chih-Hsiang;Chang, Chih-Jui
- The influence on electrical characteristics of amorphous indium tungsten oxide thin film transistors with multi-stacked active layer structure / Ruan, Dun-Bao;Liu, Po-Tsun;Gan, Kai-Jhih;Chiu, Yu-Chuan;Yu, Min-Chin
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