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dc.contributor.authorChen, ILen_US
dc.contributor.authorHsu, WCen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorSung, CPen_US
dc.contributor.authorChiou, CHen_US
dc.contributor.authorWang, JMen_US
dc.contributor.authorChang, YHen_US
dc.contributor.authorYu, HCen_US
dc.contributor.authorLee, TDen_US
dc.date.accessioned2014-12-08T15:17:31Z-
dc.date.available2014-12-08T15:17:31Z-
dc.date.issued2006-02-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.770en_US
dc.identifier.urihttp://hdl.handle.net/11536/12696-
dc.description.abstractAn emission wavelength record emission wavelength of 1245 nm in double InGaAs/GaAs quantum wells without a strain-compensated barrier is obtained by metalorganic chemical vapor deposition (MOCVD). The effect of annealing on highly strained InGaAs quantum wells is analyzed using phtoluminanescence spectra. By comparing devices p-type distributed Bragg reflector (p-DBR) growth temperatures, the preliminary results indicate that a device with a low p-DBR growth temperature of 670 degrees C exhibits a low threshold current and a high light output power. A threshold current of 6.7 mA in an InGaAs vertical-cavity surface emitting laser (VCSEL) in CW operation is realized with an emission spectrum up to 1.26 mu m.en_US
dc.language.isoen_USen_US
dc.subjectInGaAsen_US
dc.subjectMOCVDen_US
dc.subjectVCSELen_US
dc.titleEffect of annealing on low-threshold-current large-wavelength InGaAs quantum well vertical-cavity laseren_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.45.770en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume45en_US
dc.citation.issue2Aen_US
dc.citation.spage770en_US
dc.citation.epage773en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000235692100031-
dc.citation.woscount0-
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