準分子雷射結晶及反向摻雜應用於低溫p型多晶鍺薄膜電晶體之研究

Title:	準分子雷射結晶及反向摻雜應用於低溫p型多晶鍺薄膜電晶體之研究 Study on the Characteristics of Low-Temperature p-Channel Polycrystalline-Germanium Thin-Film Transistors with the Excimer Laser Crystallization and Counter Doping
Authors:	黃敬餘 Huang, Ching-Yu 鄭晃忠 Cheng, Huang-Chung 電子工程學系電子研究所
Keywords:	鍺;薄膜電晶體;準分子雷射結晶;反向摻雜;Germanium;Thin-Film Transistors;Excimer Laser Crystallization;Counter Doping
Issue Date:	2015
URI:	http://140.113.39.130/cdrfb3/record/nctu/#GT070250140 http://hdl.handle.net/11536/127064
Appears in Collections:	Thesis

APA	黃., Huang, C., 鄭., & Cheng, H. (2015). 準分子雷射結晶及反向摻雜應用於低溫p型多晶鍺薄膜電晶體之研究. http://hdl.handle.net/11536/127064.
Bibtex	@article{黃敬餘 and Huang2015, title={準分子雷射結晶及反向摻雜應用於低溫p型多晶鍺薄膜電晶體之研究}, author={黃敬餘 and Huang, Ching-Yu and 鄭晃忠 and Cheng, Huang-Chung}, journal={http://hdl.handle.net/11536/127064}, year={2015}, url={https://ir.lib.nycu.edu.tw/handle/11536/127064}, }