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dc.contributor.authorGu, SHen_US
dc.contributor.authorWang, THen_US
dc.contributor.authorLu, WPen_US
dc.contributor.authorTing, WCen_US
dc.contributor.authorKu, YHJen_US
dc.contributor.authorLu, CYen_US
dc.date.accessioned2014-12-08T15:17:37Z-
dc.date.available2014-12-08T15:17:37Z-
dc.date.issued2006-01-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2005.860632en_US
dc.identifier.urihttp://hdl.handle.net/11536/12776-
dc.description.abstractIn this paper, we use a modified charge pumping technique to characterize the programmed charge lateral distribution in a hot electron program/hot hole erase, two-bit storage nitride Flash memory cell. The stored charge distribution of each bit over the source/drain junctions can be profiled separately. Our result shows that the second programmed bit has a broader stored charge distribution than the first programmed bit. The reason is that a large channel field exists under the first programmed bit during the second bit programming. Such a large field accelerates channel electrons and causes earlier electron injection into the nitride. In addition, we find that programmed charges spread further into the channel as program/erase cycle number increases.en_US
dc.language.isoen_USen_US
dc.subjectcharge pumping (CP)en_US
dc.subjectcycling stressen_US
dc.subjectprogrammed charge distributionen_US
dc.subjecttwo-bit storage nitride Flash cellen_US
dc.titleCharacterization of programmed charge lateral distribution in a two-bit storage nitride flash memory cell by using a charge-pumping techniqueen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2005.860632en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume53en_US
dc.citation.issue1en_US
dc.citation.spage103en_US
dc.citation.epage108en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000234306700016-
dc.citation.woscount10-
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