完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Den, W | en_US |
dc.contributor.author | Huang, C | en_US |
dc.date.accessioned | 2014-12-08T15:17:37Z | - |
dc.date.available | 2014-12-08T15:17:37Z | - |
dc.date.issued | 2006 | en_US |
dc.identifier.issn | 0273-1223 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/12777 | - |
dc.identifier.uri | http://dx.doi.org/10.2166/wst.2006.195 | en_US |
dc.description.abstract | A systematic procedure has been proposed for the design of a multi-channel, continuous-flow electrocoagulation reactor of mono-polar configuration for the removal of sub-micron particles from wastewater. Using the chemical-mechanical-planarization (CMP) process as the target source of wastewater, a series of laboratory-scale studies were conducted to determine the required operating conditions for the efficient removal of the ultrafine particles. These operating criteria included charge loading ( >= 8 F m(-3)), current density ( >= 5.7 A m(-2)), hydraulic retention time ( >= 60 min), as well as the initially operational pH (7 similar to 10). Furthermore, a steady-state transport equation with second-order reaction kinetics was employed to describe the rate of coagulation as the rate-limiting factor, The actual kinetic constant determined from the laboratory-scale experiments was approximately 1.2 x 10(-21) m(3) s(-1), which was three orders of magnitude smaller than that calculated based on Brownian diffusion during the coagulation. The model was subsequently validated with a series of experiments using a pilot-scale electro-coagulation reactor geometrically similar to the laboratory-scale reactor with nearly twenty times volumetric scale-up. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | CMP | en_US |
dc.subject | electrocoagulation | en_US |
dc.subject | nano-particle | en_US |
dc.subject | silica colloids | en_US |
dc.subject | slurry | en_US |
dc.subject | wafer polishing | en_US |
dc.title | Parameter optimization and design aspect for electrocoagulation of silica nano-particles in wafer polishing wastewater | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.2166/wst.2006.195 | en_US |
dc.identifier.journal | WATER SCIENCE AND TECHNOLOGY | en_US |
dc.citation.volume | 53 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.spage | 187 | en_US |
dc.citation.epage | 194 | en_US |
dc.contributor.department | 環境工程研究所 | zh_TW |
dc.contributor.department | Institute of Environmental Engineering | en_US |
dc.identifier.wosnumber | WOS:000238143000027 | - |
顯示於類別: | 會議論文 |