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dc.contributor.authorHuang, Yen-Tangen_US
dc.contributor.authorHsu, Cheng-Hangen_US
dc.contributor.authorTsai, Chuang-Chuangen_US
dc.date.accessioned2019-04-03T06:38:46Z-
dc.date.available2019-04-03T06:38:46Z-
dc.date.issued2015-01-01en_US
dc.identifier.issn1110-662Xen_US
dc.identifier.urihttp://dx.doi.org/10.1155/2015/841614en_US
dc.identifier.urihttp://hdl.handle.net/11536/127952-
dc.description.abstractThe hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon (mu c-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO2:F-coated glass substrates. The substrates of SnO2:F, SnO2:F/mu c-Si:H(p), and SnO2:F/a-Si: H(p) were exposed to H-2 plasma to investigate the property change. Our results showed that capping a thin layer of a-Si: H(p) on SnO2:F can minimize the Sn reduction during the deposition process which had H-2-containing plasma. Optical measurement has also revealed that a-Si: H(p) capped SnO2:F glass had a higher optical transmittance. When the 20 nm mu c-Si: H(p) layer was replaced by a 3 nm a-Si: H(p)/17 nm mu c-Si:H(p) double window layer in the cell, the conversion efficiency (eta) and the short-circuit current density (J(SC)) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nm mu c-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/mu c-Si: H(p) window layer, with V-OC = 490 mV, J(SC) = 19.50 mA/cm(2), and FF = 64.83%.en_US
dc.language.isoen_USen_US
dc.titleEnhancement of Spectral Response in mu c-Si1-xGex:H Thin-Film Solar Cells with a-Si:H/mu c-Si:H P-Type Window Layersen_US
dc.typeArticleen_US
dc.identifier.doi10.1155/2015/841614en_US
dc.identifier.journalINTERNATIONAL JOURNAL OF PHOTOENERGYen_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000356781100001en_US
dc.citation.woscount0en_US
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