完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Huang, Yen-Tang | en_US |
dc.contributor.author | Hsu, Cheng-Hang | en_US |
dc.contributor.author | Tsai, Chuang-Chuang | en_US |
dc.date.accessioned | 2019-04-03T06:38:46Z | - |
dc.date.available | 2019-04-03T06:38:46Z | - |
dc.date.issued | 2015-01-01 | en_US |
dc.identifier.issn | 1110-662X | en_US |
dc.identifier.uri | http://dx.doi.org/10.1155/2015/841614 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/127952 | - |
dc.description.abstract | The hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon (mu c-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO2:F-coated glass substrates. The substrates of SnO2:F, SnO2:F/mu c-Si:H(p), and SnO2:F/a-Si: H(p) were exposed to H-2 plasma to investigate the property change. Our results showed that capping a thin layer of a-Si: H(p) on SnO2:F can minimize the Sn reduction during the deposition process which had H-2-containing plasma. Optical measurement has also revealed that a-Si: H(p) capped SnO2:F glass had a higher optical transmittance. When the 20 nm mu c-Si: H(p) layer was replaced by a 3 nm a-Si: H(p)/17 nm mu c-Si:H(p) double window layer in the cell, the conversion efficiency (eta) and the short-circuit current density (J(SC)) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nm mu c-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/mu c-Si: H(p) window layer, with V-OC = 490 mV, J(SC) = 19.50 mA/cm(2), and FF = 64.83%. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Enhancement of Spectral Response in mu c-Si1-xGex:H Thin-Film Solar Cells with a-Si:H/mu c-Si:H P-Type Window Layers | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1155/2015/841614 | en_US |
dc.identifier.journal | INTERNATIONAL JOURNAL OF PHOTOENERGY | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | 光電工程研究所 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.contributor.department | Institute of EO Enginerring | en_US |
dc.identifier.wosnumber | WOS:000356781100001 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |