標題: | 1.3-mu m InAs-InGaAs quantum-dot vertical-cavity surface-emitting laser with fully doped DBRs grown by MBE |
作者: | Yu, HC Wang, JS Su, YK Chang, SJ Lai, FI Chang, YH Kuo, HC Sung, CP Yang, HPD Lin, KF Wang, JM Chi, JY Hsiao, RS Mikhrin, S 光電工程學系 Department of Photonics |
關鍵字: | fully doped distributed Bragg reflector (DBR);InAs quantum dot (QD);molecular beam epitaxy (NME);vertical-cavity surface-emitting laser (VCSEL) |
公開日期: | 1-Jan-2006 |
摘要: | We report InAs-InGaAs quantum-dot vertical-cavity surface-emitting lasers (VCSELs) grown by molecular beam epitaxy with fully doped n- and p-doped AlGaAs distributed Bragg reflectors and including an AlAs layer to form a current and waveguiding aperture. The metal contacts are deposited on a topmost p(+) (GaAs)-Ga-. contact layer and on the bottom surface of the n(+)-GaAs substrate. This conventional selectively oxidized top-emitting device configuration avoids the added complexity of fabricating intracavity or coplanar ohmic contacts. The VCSELs operate continuous-wave at room temperature with peak output powers of 0.33 mW and differential slope efficiencies up to 0.23 W/A. The peak lasing wavelengths are near 1.275 mu m, with a sidemode suppression ratio of 28 dB. |
URI: | http://dx.doi.org/10.1109/LPT.2005.863166 http://hdl.handle.net/11536/12847 |
ISSN: | 1041-1135 |
DOI: | 10.1109/LPT.2005.863166 |
期刊: | IEEE PHOTONICS TECHNOLOGY LETTERS |
Volume: | 18 |
Issue: | 1-4 |
起始頁: | 418 |
結束頁: | 420 |
Appears in Collections: | Articles |
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