Title: Evaluation of Ultra-low Specific Contact Resistance Extraction by Cross-Bridge Kelvin Resistor Structure and Transmission Line Method Structure
Authors: Tsui, Bing-Yue
Tseng, Hsuan-Tzu
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Keywords: specific contact resistance;contact resistivity;cross-bridge Kelvin resistor;transmission line method
Issue Date: 1-Jan-2014
Abstract: This work evaluates the accuracy of the specific contact resistance extraction by the cross-bridge Kelvin resistor (CBKR) structure and the self-aligned transmission line method (mTLM) structure considering three-dimensional effect. The mTLM structure is more accurate than the CBKR structure in theory but more sensitive to process variation. The sensitivity to process variation could be suppressed by averaging large amount data. Nevertheless, the recessed contact interface would underestimate the true specific contact resistance and would cause complicated extraction problem for both test structures as the contact resistivity becomes less than 10(-8) ohm-cm(2).
URI: http://hdl.handle.net/11536/128482
ISBN: 978-1-4799-2192-8
ISSN: 
Journal: 2014 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES (ICMTS)
Begin Page: 58
End Page: 63
Appears in Collections:Conferences Paper