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dc.contributor.authorHsu, CYen_US
dc.contributor.authorLan, WHen_US
dc.contributor.authorWu, YCSen_US
dc.date.accessioned2014-12-08T15:17:51Z-
dc.date.available2014-12-08T15:17:51Z-
dc.date.issued2006en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/12940-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2184071en_US
dc.description.abstractWe have fabricated GaN-based light-emitting diodes (LEDs) using transparent indium tin oxide-based (ITO-based) p contacts. The current-voltage characteristics and life tests of GaN-based LEDs have been studied. LED life tests showed that a pure ITO contact layer had poor reliability at high current stress. We also found that the GaN-based LED could achieve good reliability with a NiO/ITO contact layer. Using transmission electron microscopy and energy-dispersive X-ray spectrometer analyses, we observed In-contained metallic interface between the p-GaN layer and the pure ITO contact layer after annealing at 600 degrees C. It revealed that ITO would react at interface or indiffuse near the interface at 600 C. The LED was degraded with unstable interfaces after life tests (stressed by a 50-mA current injection). To improve the reliability of GaN-based LEDs with the ITO contact layer, we suggest that the NiO layer be used to prevent the reaction and block the leakage pathway. (c) 2006 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleThe influences of contact interfaces between the indium tin oxide-based contact layer and GaN-based LEDsen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2184071en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume153en_US
dc.citation.issue5en_US
dc.citation.spageG475en_US
dc.citation.epageG478en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000236516000075-
dc.citation.woscount1-
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