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dc.contributor.authorLin, Hung-Rueien_US
dc.contributor.authorCheng, Chiao-Huaen_US
dc.contributor.authorHung, Shao-Kangen_US
dc.date.accessioned2016-03-28T00:04:21Z-
dc.date.available2016-03-28T00:04:21Z-
dc.date.issued2015-10-01en_US
dc.identifier.issn0957-4158en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.mechatronics.2015.08.003en_US
dc.identifier.urihttp://hdl.handle.net/11536/129589-
dc.description.abstractThis paper presents a particular mechanism design which is inherently inclined to have no parasitic rotation. The flexure-based stage comprises symmetric flexure guiding mechanism and two piezoelectric stack actuators. The layout of the stage is evaluated by finite element analysis, and the results indicate that the proposed design exhibits ultralow parasitic rotation. A prototype of the stage is then fabricated, and its performance is tested. Experimental results show that the stage has a stroke of 500 mu m x 500 mu m and the crosstalk is less than 1%. The maximum parasitic rotation is +/- 1.2 arcsec at a stroke of 500 mu m. (C) 2015 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectNanopositioneren_US
dc.subjectFlexure mechanismen_US
dc.subjectParasitic rotationen_US
dc.titleDesign and quasi-static characteristics study on a planar piezoelectric nanopositioner with ultralow parasitic rotationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.mechatronics.2015.08.003en_US
dc.identifier.journalMECHATRONICSen_US
dc.citation.volume31en_US
dc.citation.spage180en_US
dc.citation.epage188en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000367772000020en_US
dc.citation.woscount0en_US
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