標題: | Improvement of Bipolar Switching Properties of Gd:SiOx RRAM Devices on Indium Tin Oxide Electrode by Low-Temperature Supercritical CO2 Treatment |
作者: | Chen, Kai-Huang Chang, Kuan-Chang Chang, Ting-Chang Tsai, Tsung-Ming Liang, Shu-Ping Young, Tai-Fa Syu, Yong-En Sze, Simon M. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Nonvolatile memory;Gadolinium;Supercritical CO2;Resistive switching;Silicon oxide |
公開日期: | 1-二月-2016 |
摘要: | Bipolar switching resistance behaviors of the Gd:SiO2 resistive random access memory (RRAM) devices on indium tin oxide electrode by the low-temperature supercritical CO2-treated technology were investigated. For physical and electrical measurement results obtained, the improvement on oxygen qualities, properties of indium tin oxide electrode, and operation current of the Gd:SiO2 RRAM devices were also observed. In addition, the initial metallic filament-forming model analyses and conduction transferred mechanism in switching resistance properties of the RRAM devices were verified and explained. Finally, the electrical reliability and retention properties of the Gd:SiO2 RRAM devices for low-resistance state (LRS)/high-resistance state (HRS) in different switching cycles were also measured for applications in nonvolatile random memory devices. |
URI: | http://dx.doi.org/10.1186/s11671-016-1272-5 http://hdl.handle.net/11536/129643 |
ISSN: | 1556-276X |
DOI: | 10.1186/s11671-016-1272-5 |
期刊: | NANOSCALE RESEARCH LETTERS |
Volume: | 11 |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |