完整後設資料紀錄
DC 欄位語言
dc.contributor.author張立zh_TW
dc.contributor.authorCHANG LIen_US
dc.date.accessioned2016-03-28T08:17:22Z-
dc.date.available2016-03-28T08:17:22Z-
dc.date.issued2015en_US
dc.identifier.govdocMOST104-2221-E009-028-MY3zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/129929-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=11573178&docId=469159en_US
dc.description.sponsorship科技部zh_TW
dc.language.isozh_TWen_US
dc.title微波電漿氮化金屬氧化物及化學氣相沉積鑽石zh_TW
dc.titleNitridation of Metal Oxides and Chemical Vapor Deposition of Diamond by Microwave Plasmaen_US
dc.typePlanen_US
dc.contributor.department國立交通大學材料科學與工程學系(所)zh_TW
顯示於類別:研究計畫