完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 張立 | zh_TW |
dc.contributor.author | CHANG LI | en_US |
dc.date.accessioned | 2016-03-29T00:01:15Z | - |
dc.date.available | 2016-03-29T00:01:15Z | - |
dc.date.issued | 2016 | en_US |
dc.identifier.govdoc | MOST104-2221-E009-028-MY3 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/130975 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=11726714&docId=480827 | en_US |
dc.description.sponsorship | 科技部 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | 微波電漿氮化金屬氧化物及化學氣相沉積鑽石 | zh_TW |
dc.title | Nitridation of Metal Oxides and Chemical Vapor Deposition of Diamond by Microwave Plasma | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學材料科學與工程學系(所) | zh_TW |
顯示於類別: | 研究計畫 |