大面積光刻製程用之全反射軟性光罩設計

Title:	大面積光刻製程用之全反射軟性光罩設計 Design of the Total-Internal-Reflection-Based Soft Photomask for Large-Area Photolithography
Authors:	洪紹剛國立交通大學機械工程學系（所）
Keywords:	;
Issue Date:	2016
Abstract:
Gov't Doc #:	MOST105-2221-E009-060
URI:	https://www.grb.gov.tw/search/planDetail?id=11881354&docId=485938 http://hdl.handle.net/11536/131814
Appears in Collections:	Research Plans