标题: | Stresses and temperature stability of dense wavelength division multiplexing filters prepared by reactive ion-assisted e-gun evaporation |
作者: | Wei, CT Shieh, HPD 光电工程学系 显示科技研究所 Department of Photonics Institute of Display |
关键字: | DWDM filters;reactive ion-assisted deposition;compression stress;Fabry-Perot filter;mutilayer |
公开日期: | 1-十月-2005 |
摘要: | In this paper, we report the in situ measurement of the temperature stability of narrow-band-pass filters on different types of substrate, for dense wavelength division multiplexing (DWDM) filters in optical-fiber transmission systems. The DWDM filters were designed as all-dielectric Fabry-Perot filters and fabricated by reactive ion-assisted deposition. Ta,05 and SiO(2) were used as high- and low-refractive-index layers, respectively, for constructing the DWDM filters. The accuracy and stability of the coating process were evaluated for fabricating the DWDM filters for the temperature stability of the center wavelength. The center wavelength shift was determined to be greatly dependent on the coefficient of thermal expansion of the substrate on which the filter is deposited. |
URI: | http://dx.doi.org/10.1143/JJAP.44.7577 http://hdl.handle.net/11536/13199 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.44.7577 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS |
Volume: | 44 |
Issue: | 10 |
起始页: | 7577 |
结束页: | 7581 |
显示于类别: | Articles |
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