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dc.contributor.authorWei, CTen_US
dc.contributor.authorShieh, HPDen_US
dc.date.accessioned2014-12-08T15:18:18Z-
dc.date.available2014-12-08T15:18:18Z-
dc.date.issued2005-10-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.7577en_US
dc.identifier.urihttp://hdl.handle.net/11536/13199-
dc.description.abstractIn this paper, we report the in situ measurement of the temperature stability of narrow-band-pass filters on different types of substrate, for dense wavelength division multiplexing (DWDM) filters in optical-fiber transmission systems. The DWDM filters were designed as all-dielectric Fabry-Perot filters and fabricated by reactive ion-assisted deposition. Ta,05 and SiO(2) were used as high- and low-refractive-index layers, respectively, for constructing the DWDM filters. The accuracy and stability of the coating process were evaluated for fabricating the DWDM filters for the temperature stability of the center wavelength. The center wavelength shift was determined to be greatly dependent on the coefficient of thermal expansion of the substrate on which the filter is deposited.en_US
dc.language.isoen_USen_US
dc.subjectDWDM filtersen_US
dc.subjectreactive ion-assisted depositionen_US
dc.subjectcompression stressen_US
dc.subjectFabry-Perot filteren_US
dc.subjectmutilayeren_US
dc.titleStresses and temperature stability of dense wavelength division multiplexing filters prepared by reactive ion-assisted e-gun evaporationen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.44.7577en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume44en_US
dc.citation.issue10en_US
dc.citation.spage7577en_US
dc.citation.epage7581en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000232739300079-
dc.citation.woscount4-
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