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dc.contributor.authorPhuoc Huu Leen_US
dc.contributor.authorChiu, Shao-Pinen_US
dc.contributor.authorJian, Sheng-Ruien_US
dc.contributor.authorLuo, Chih Weien_US
dc.contributor.authorLin, Jiunn-Yuanen_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.contributor.authorWu, Kaung Hsiungen_US
dc.contributor.authorGospodinov, M.en_US
dc.date.accessioned2017-04-21T06:55:53Z-
dc.date.available2017-04-21T06:55:53Z-
dc.date.issued2016-09-15en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2016.03.226en_US
dc.identifier.urihttp://hdl.handle.net/11536/133708-
dc.description.abstractNew ternary phase of Bi3Se2Te thin films were successfully grown through pulsed laser deposition with a single Bi2Se2Te crystal as the target. Bi-rich and Se-and Te-deficient compositions deposited at a substrate temperature (T-s) of 250 degrees C and helium gas pressures (P-He) ranging from 2.0 x 10(-5) to 6.5 x 10(-1) Torr aided the formation of the dominant Bi-rich phase: Bi3Se2Te. The films were grown epitaxially on Al2O3 (001) substrates with Bi3Se2Te [001]//Al2O3 [001] and Bi3Se2Te [110]//Al2O3 [210]. An increase in P-He remarkably enhanced the hardness and Young\'s modulus of the films, primarily because of the decrease in nanograin size, following the HallePetch relationship. Moreover, the Bi3Se2Te films present linear magnetoresistance under a high perpendicular magnetic field (B >= 4 T) and twodimensional weak antilocalization effect under a low B (+/- 1 T) which may be attributed to topological insulator surface state (TSS). Clearly, further theoretical calculations and experiments are needed to confirm the suggested interpretation. (C) 2016 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectTopological insulatoren_US
dc.subjectBi3Se2Teen_US
dc.subjectNanoindentationen_US
dc.subjectWeak antilocalization (WAL)en_US
dc.subjectPulsed laser deposition (PLD)en_US
dc.titleNanomechanical, structural, and transport properties of Bi3Se2Te thin filmsen_US
dc.identifier.doi10.1016/j.jallcom.2016.03.226en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume679en_US
dc.citation.spage350en_US
dc.citation.epage357en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000376104900047en_US
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