完整後設資料紀錄
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dc.contributor.authorLi, Chien-Ien_US
dc.contributor.authorLin, Jheng-Cyuanen_US
dc.contributor.authorLiu, Heng-Juien_US
dc.contributor.authorChu, Ming-Wenen_US
dc.contributor.authorChen, Hsiao-Wenen_US
dc.contributor.authorMa, Chun-Haoen_US
dc.contributor.authorTsai, Chih-Yaen_US
dc.contributor.authorHuang, Hsin-Weien_US
dc.contributor.authorLin, Hong-Jien_US
dc.contributor.authorLiu, Hsiang-Linen_US
dc.contributor.authorChiu, Po-Wenen_US
dc.contributor.authorChu, Ying-Haoen_US
dc.date.accessioned2017-04-21T06:56:33Z-
dc.date.available2017-04-21T06:56:33Z-
dc.date.issued2016-06-14en_US
dc.identifier.issn0897-4756en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acs.chemmater.6b01180en_US
dc.identifier.urihttp://hdl.handle.net/11536/133931-
dc.description.abstractVanadium dioxide (VO2) is a compelling candidate for next-generation electronics beyond conventional silicon-based devices due to the exhibition of a sharp metal insulator transition. In this study, in order to realize functional VO2 film for flexible electronics, the growth of VO2 film directly on a transparent and flexible muscovite via van der Waals epitaxy is established. The heteroepitaxy and structural transition of VO2 films on muscovite are examined by a combination of high resolution X-ray diffraction, transmission electron microscopy, and Raman spectroscopy. The unique metal insulator transition of VO2 is further revealed with a change in electrical resistance over 10(3) and a more than 50% variation of optical transmittance. Furthermore, due to the nature of muscovite, the VO2/muscovite heterostructure possesses superior flexibility and optical transparence. The approach developed in this study paves an intriguing way to fabricate functional VO2 film for the applications in flexible electronics.en_US
dc.language.isoen_USen_US
dc.titlevan der Waal Epitaxy of Flexible and Transparent VO2 Film on Muscoviteen_US
dc.identifier.doi10.1021/acs.chemmater.6b01180en_US
dc.identifier.journalCHEMISTRY OF MATERIALSen_US
dc.citation.volume28en_US
dc.citation.issue11en_US
dc.citation.spage3914en_US
dc.citation.epage3919en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000378016400043en_US
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