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dc.contributor.authorAluguri, Rakeshen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2019-04-03T06:39:55Z-
dc.date.available2019-04-03T06:39:55Z-
dc.date.issued2016-09-01en_US
dc.identifier.issn2168-6734en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JEDS.2016.2594190en_US
dc.identifier.urihttp://hdl.handle.net/11536/134065-
dc.description.abstractCross point RRAM arrays is the emerging area for future memory devices due to their high density, excellent scalability. Sneak path problem is the main disadvantage of cross point structures which needed to be overcome to produce real devices. Various self-rectifying cells like complementary resistive cell, hybrid RRAM cell, valence modulated conductive oxide RRAM and non-linear resistive memory with tunneling barrier, etc., are proposed to overcome the sneak path problem and to achieve the high density with good on/off ratio. However, it is challenging to fabricate the self-rectifying cells operating at low program/erase voltages with high non-linearity for both read and write operations and exhibiting good retention and endurance characteristics at the same time for a single device. 1S1R devices are more attractive than SRC due to large optimization possibilities to obtain better device performance as they have separate selector cell and memory cell which decouples the control parameters. Various kinds of selector devices like Si-based selector, metal-oxide based selector, threshold switch selector, mixed ionic-electronic conduction selector etc., are under intense research to obtain the best performance cross point memory devices. In this paper, we have briefly discussed about recent progress on various self-rectifying cells and selector devices for obtaining 3-D stackable cross point memory arrays.en_US
dc.language.isoen_USen_US
dc.subjectCross bar RRAMen_US
dc.subjectself-rectifying cellsen_US
dc.subjectselector devicesen_US
dc.titleOverview of Selector Devices for 3-D Stackable Cross Point RRAM Arraysen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JEDS.2016.2594190en_US
dc.identifier.journalIEEE JOURNAL OF THE ELECTRON DEVICES SOCIETYen_US
dc.citation.volume4en_US
dc.citation.issue5en_US
dc.citation.spage294en_US
dc.citation.epage306en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000382676700014en_US
dc.citation.woscount29en_US
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