標題: | A Film-Profile-Engineered 3-D InGaZnO Inverter Technology With Systematically Tunable Threshold Voltage |
作者: | Lyu, Rong-Jhe Lin, Horng-Chih Li, Pei-Wen Huang, Tiao-Yuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Film profile engineering (FPE);InGaZnO (IGZO);inverter;logic gate;metal oxide (MO);thin-film transistors (TFTs);voltage gain |
公開日期: | Sep-2016 |
摘要: | In this paper, a new depletion-load metal oxide-based inverter with 3-D structure is realized with film-profile-engineered InGaZnO (IGZO) thin-film transistors (TFTs). The proposed inverter possesses vertically stacked load and drive TFTs whose threshold voltage can be flexibly adjusted into a wide range of -2.3-1 V through merely adjusting the geometric parameters without the necessity of additional processes or masks. The 3-D IGZO inverters constructed through the proposed technology demonstrate full-swing switching with voltage gains up to 19 V/V under an operation voltage of 9 V. The 3-D inverters can not only reduce the footprint but also promote the resistance toward light-induced instability. |
URI: | http://dx.doi.org/10.1109/TED.2016.2585519 http://hdl.handle.net/11536/134251 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2016.2585519 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 63 |
Issue: | 9 |
起始頁: | 3533 |
結束頁: | 3539 |
Appears in Collections: | Articles |