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dc.contributor.authorLyu, Rong-Jheen_US
dc.contributor.authorLin, Horng-Chihen_US
dc.contributor.authorLi, Pei-Wenen_US
dc.contributor.authorHuang, Tiao-Yuanen_US
dc.date.accessioned2017-04-21T06:55:20Z-
dc.date.available2017-04-21T06:55:20Z-
dc.date.issued2016-09en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2016.2585519en_US
dc.identifier.urihttp://hdl.handle.net/11536/134251-
dc.description.abstractIn this paper, a new depletion-load metal oxide-based inverter with 3-D structure is realized with film-profile-engineered InGaZnO (IGZO) thin-film transistors (TFTs). The proposed inverter possesses vertically stacked load and drive TFTs whose threshold voltage can be flexibly adjusted into a wide range of -2.3-1 V through merely adjusting the geometric parameters without the necessity of additional processes or masks. The 3-D IGZO inverters constructed through the proposed technology demonstrate full-swing switching with voltage gains up to 19 V/V under an operation voltage of 9 V. The 3-D inverters can not only reduce the footprint but also promote the resistance toward light-induced instability.en_US
dc.language.isoen_USen_US
dc.subjectFilm profile engineering (FPE)en_US
dc.subjectInGaZnO (IGZO)en_US
dc.subjectinverteren_US
dc.subjectlogic gateen_US
dc.subjectmetal oxide (MO)en_US
dc.subjectthin-film transistors (TFTs)en_US
dc.subjectvoltage gainen_US
dc.titleA Film-Profile-Engineered 3-D InGaZnO Inverter Technology With Systematically Tunable Threshold Voltageen_US
dc.identifier.doi10.1109/TED.2016.2585519en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume63en_US
dc.citation.issue9en_US
dc.citation.spage3533en_US
dc.citation.epage3539en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000384574400024en_US
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