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dc.contributor.authorKwai, Ding-Mingen_US
dc.contributor.authorHsiao, Ching-Huaen_US
dc.contributor.authorKuo, Chung-Pingen_US
dc.contributor.authorChuang, Chi-Hsienen_US
dc.contributor.authorHsu, Min-Chungen_US
dc.contributor.authorChen, Yi-Chunen_US
dc.contributor.authorSung, Yu-Lingen_US
dc.contributor.authorPan, Hsien-Yuen_US
dc.contributor.authorLee, Chia-Hsinen_US
dc.contributor.authorChang, Meng-Fanen_US
dc.contributor.authorChou, Yung-Faen_US
dc.date.accessioned2017-04-21T06:49:39Z-
dc.date.available2017-04-21T06:49:39Z-
dc.date.issued2006en_US
dc.identifier.isbn0-7695-2572-5en_US
dc.identifier.issn1087-4852en_US
dc.identifier.urihttp://hdl.handle.net/11536/134498-
dc.description.abstractThis paper highlights the cell current characterization of a low leakage 6T SRAM by adjusting the threshold voltages of the transistors in the memory array to reduce the standby power. Experiments using a 0.25 mu m 2.5V standard CMOS process with and without the additional threshold voltage adjustment implant on a 1Mb test chip demonstrate the effectiveness. A substantial standby power reduction by an order of magnitude is achievable. However, it incurs a wider cell current variation, which is pronounced only at a lower supply voltage. As the supply voltage decreases, the percent deviation from the average value increases. This can be modeled by a simple power-law relationship. The result has important implications in both design and manufacturing of the low leakage SRAM. Comparing with the generic cell current without the additional threshold voltage adjustment, the crossover point of their percent deviations at 2V signifies two separate circuit strategies: operating at 1.5V requires larger sensing margin and operating at 2.5V enjoys better manufacturability. Hence, for the applications requiring low voltage operations, it favors a boosted supply voltage applied to a selected cell during the read access.en_US
dc.language.isoen_USen_US
dc.titleSRAM cell current in low leakage designen_US
dc.typeProceedings Paperen_US
dc.identifier.journalMTDT'06: 2006 IEEE INTERNATIONAL WORKSHOP ON MEMORY TECHNOLOGY, DESIGN, AND TESTING, PROCEEDINGSen_US
dc.citation.spage65en_US
dc.citation.epage+en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000240106100010en_US
dc.citation.woscount0en_US
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