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dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChin, Alberten_US
dc.contributor.authorYeh, F. S.en_US
dc.date.accessioned2017-04-21T06:49:53Z-
dc.date.available2017-04-21T06:49:53Z-
dc.date.issued2010en_US
dc.identifier.isbn978-1-4244-7637-4en_US
dc.identifier.urihttp://dx.doi.org/10.1109/VLSIT.2010.5556180en_US
dc.identifier.urihttp://hdl.handle.net/11536/134863-
dc.description.abstractWe report high performance RRAM of ultra-low 4 mu W set power (-3.5 mu A at -1.1 V), 16 pW reset power (0.12 nA at 0.13 V), large extrapolated 10-year on/off retention window of 4x10(5) at 85 degrees C, good 10(6) cycling endurance and fast 50 ns switching for the first time. These were achieved using novel covalent-bond-dielectric/metal-oxide and low cost electrodes.en_US
dc.language.isoen_USen_US
dc.titleNovel Ultra-Low Power RRAM with Good Endurance and Retentionen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1109/VLSIT.2010.5556180en_US
dc.identifier.journal2010 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERSen_US
dc.citation.spage85en_US
dc.citation.epage+en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000287495500029en_US
dc.citation.woscount31en_US
Appears in Collections:Conferences Paper