The Effect of X-ray Irradiation on the Novella Type Photoresist

標題:	The Effect of X-ray Irradiation on the Novella Type Photoresist
作者:	You, Hsin-Chiang Shieh, Shao-Hui Zhang, Shiang-Jun Ko, Fu-Hsiang Lin, Hsiung-Min Tsaur, Shyh-Chang Lin, Chin-Che 材料科學與工程學系奈米科技碩博班 Graduate Program of Nanotechnology , Department of Materials Science and Engineering
公開日期:	2010
URI:	http://hdl.handle.net/11536/134877
ISBN:	978-1-4244-3543-2
期刊:	INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2
起始頁:	1063
結束頁:	1063
顯示於類別：	會議論文