標題: The Effect of X-ray Irradiation on the Novella Type Photoresist
作者: You, Hsin-Chiang
Shieh, Shao-Hui
Zhang, Shiang-Jun
Ko, Fu-Hsiang
Lin, Hsiung-Min
Tsaur, Shyh-Chang
Lin, Chin-Che
材料科學與工程學系奈米科技碩博班
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
公開日期: 2010
URI: http://hdl.handle.net/11536/134877
ISBN: 978-1-4244-3543-2
期刊: INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2
起始頁: 1063
結束頁: 1063
Appears in Collections:Conferences Paper