標題: A BIOCOMPATIBLE AND FLEXIBLE RF CMOS TECHNOLOGY AND THE CHARACTERIZATION OF THE FLEXIBLE MOS TRANSISTORS UNDER BENDING STRESSES
作者: Hsieh, C-Y
Chen, J-S
Tsou, W-A
Yeh, Y-T
Wen, K-A
Fan, L-S
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 2009
摘要: To enable medical implants such as artificial retina, smart stent microsensors and other implantable wireless sensors, we developed a biocompatible and flexible RE CMOS technology based on a 0.18 mu m CMOS process on 8-inch SOT (silicon on insulator) wafers. The silicon substrate for MOS transistors is 1 mu m thick and sandwiched between two parylene layers. Since the potential implantable microsystems are intended to operate under external mechanical stresses, the effects of bending stresses (between -100 MPa to 100 MPa) on the flexible electronic devices are characterized. The piezo-coefficients for the flexible MOS transistors are extracted from measured I-V characteristics. While carrier mobility is linearly related to the stresses in both longitudinal and transverse directions, the threshold voltage is relatively insensitive to stresses. The experiment results can be used for pre-compensations in circuits design based on this technology.
URI: http://dx.doi.org/10.1109/MEMSYS.2009.4805460
http://hdl.handle.net/11536/134984
ISBN: 978-1-4244-2978-3
ISSN: 1084-6999
DOI: 10.1109/MEMSYS.2009.4805460
期刊: IEEE 22ND INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2009)
起始頁: 627
結束頁: 629
顯示於類別:會議論文