Full metadata record
DC FieldValueLanguage
dc.contributor.authorWu, You-Linen_US
dc.contributor.authorLin, Shi-Tinen_US
dc.contributor.authorYang, Chang Chengen_US
dc.contributor.authorWu, Chien-Hungen_US
dc.contributor.authorChin, Alberten_US
dc.date.accessioned2017-04-21T06:49:09Z-
dc.date.available2017-04-21T06:49:09Z-
dc.date.issued2007en_US
dc.identifier.isbn978-1-4244-1891-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/135140-
dc.language.isoen_USen_US
dc.titleStudy of low-temperature and post-stress hysteresis in high-k gate dielectricsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2en_US
dc.citation.spage175en_US
dc.citation.epage+en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000255857100089en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper