完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Huang, Wen-Chang | en_US |
dc.contributor.author | Horng, Chia-Tsung | en_US |
dc.contributor.author | Chen, Yu-Min | en_US |
dc.contributor.author | Hsu, Yu-Kuei | en_US |
dc.contributor.author | Chang, Chen-Shiung | en_US |
dc.date.accessioned | 2017-04-21T06:49:04Z | - |
dc.date.available | 2017-04-21T06:49:04Z | - |
dc.date.issued | 2008 | en_US |
dc.identifier.issn | 1862-6351 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1002/pssc.200878881 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/135653 | - |
dc.description.abstract | The Schottky barrier characteristics of Al on a Bridgman grown p-GaSe layered semiconductor have been investigated using current voltage temperature (I-V-T) characteristics over a temperature range of 198 K 373 K. The forward I-V-T data reveals decrease at the barrier height but an increase at the ideality factor with decreasing in measurement temperature. For the 300 degrees C annealed diode, the barrier height decreased from 1.04 eV to 0.6eV and the ideality increased from 1.4 to 2.4, as the temperature decreased from 37.3 K to 198 K. The Richardson plot showed activation energy of 0.26 eV at high temperature region while showed a lower energy of 0.07eV at low temperature region. (C) 2008 WILEY-VCH Verlag GmbH & Co, KGaA, Weinheim. | en_US |
dc.language.iso | en_US | en_US |
dc.title | The contact characteristics of Al p-GaSe Schottky diode | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.doi | 10.1002/pssc.200878881 | en_US |
dc.identifier.journal | PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 10 | en_US |
dc.citation.volume | 5 | en_US |
dc.citation.issue | 10 | en_US |
dc.citation.spage | 3405 | en_US |
dc.citation.epage | + | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000259260500038 | en_US |
dc.citation.woscount | 3 | en_US |
顯示於類別: | 會議論文 |