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dc.contributor.authorHuang, Wen-Changen_US
dc.contributor.authorHorng, Chia-Tsungen_US
dc.contributor.authorChen, Yu-Minen_US
dc.contributor.authorHsu, Yu-Kueien_US
dc.contributor.authorChang, Chen-Shiungen_US
dc.date.accessioned2017-04-21T06:49:04Z-
dc.date.available2017-04-21T06:49:04Z-
dc.date.issued2008en_US
dc.identifier.issn1862-6351en_US
dc.identifier.urihttp://dx.doi.org/10.1002/pssc.200878881en_US
dc.identifier.urihttp://hdl.handle.net/11536/135653-
dc.description.abstractThe Schottky barrier characteristics of Al on a Bridgman grown p-GaSe layered semiconductor have been investigated using current voltage temperature (I-V-T) characteristics over a temperature range of 198 K 373 K. The forward I-V-T data reveals decrease at the barrier height but an increase at the ideality factor with decreasing in measurement temperature. For the 300 degrees C annealed diode, the barrier height decreased from 1.04 eV to 0.6eV and the ideality increased from 1.4 to 2.4, as the temperature decreased from 37.3 K to 198 K. The Richardson plot showed activation energy of 0.26 eV at high temperature region while showed a lower energy of 0.07eV at low temperature region. (C) 2008 WILEY-VCH Verlag GmbH & Co, KGaA, Weinheim.en_US
dc.language.isoen_USen_US
dc.titleThe contact characteristics of Al p-GaSe Schottky diodeen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1002/pssc.200878881en_US
dc.identifier.journalPHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 10en_US
dc.citation.volume5en_US
dc.citation.issue10en_US
dc.citation.spage3405en_US
dc.citation.epage+en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000259260500038en_US
dc.citation.woscount3en_US
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