完整後設資料紀錄
DC 欄位語言
dc.contributor.authorYi, S. H.en_US
dc.contributor.authorChin, Alberten_US
dc.date.accessioned2017-04-21T06:49:30Z-
dc.date.available2017-04-21T06:49:30Z-
dc.date.issued2015en_US
dc.identifier.isbn978-1-4799-8364-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/135768-
dc.description.abstractPower consumption is the crucial challenge for electronics. To lower the DC leakage power (P-DC), we applied the high-kappa gate dielectric to CMOS from the physics of Q equivalent to CV. More than 2 orders of magnitude lower P-DC is obtained at small 0.5 similar to 0.9 nm equivalent-oxide-thickness (EOT). The high-kappa dielectric also increases the charge controllability of flash memory and decrease the V-T disturbance by nearly cells, which improves cell density and cost. The AC power (P-AC) can be lowered by using high-mobility Ge CMOS at a lower V-D and 3D IC with a small capacitance, from basic physics of P-AC equivalent to CV(D)(2)f/2.en_US
dc.language.isoen_USen_US
dc.subjectultra-low poweren_US
dc.subjecthigh-kappaen_US
dc.subjectGeen_US
dc.subjectCMOSen_US
dc.subjectflash memoryen_US
dc.titleUltra-Low Power Green Electronic Devicesen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPROCEEDINGS OF THE 2015 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)en_US
dc.citation.spage285en_US
dc.citation.epage288en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000380458700072en_US
dc.citation.woscount0en_US
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