Study on Transparent Amorphous Indium Oxide Thin Film Transistors Technology

標題:	Study on Transparent Amorphous Indium Oxide Thin Film Transistors Technology
作者:	Chang, Chih-Hsiang Lai, Yu-Chia Fan, Yang-Shun Chang, Che-Chia Liu, Po-Tsun 電子工程學系及電子研究所光電工程學系顯示科技研究所 Department of Electronics Engineering and Institute of Electronics Department of Photonics Institute of Display
公開日期:	2015
摘要:	In this study, we analyzed the In2O3 thin flints with different oxygen How rate during sputtering as the transistor\'s channel layer. The electrical analysis including device\'s reliability and material analysis were both examined.
URI:	http://hdl.handle.net/11536/136105
ISBN:	978-1-4799-9928-6
ISSN:	1946-1550
期刊:	PROCEEDINGS OF THE 22ND INTERNATIONAL SYMPOSIUM ON THE PHYSICAL AND FAILURE ANALYSIS OF INTEGRATED CIRCUITS (IPFA 2015)
起始頁:	374
結束頁:	378
Appears in Collections:	Conferences Paper