完整後設資料紀錄
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dc.contributor.authorChen, Nai-Huien_US
dc.contributor.authorChen, Chien-Hsuen_US
dc.contributor.authorLee, Chien-Pingen_US
dc.date.accessioned2017-04-21T06:48:54Z-
dc.date.available2017-04-21T06:48:54Z-
dc.date.issued2016-11-25en_US
dc.identifier.issn0257-8972en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.surfcoat.2016.05.019en_US
dc.identifier.urihttp://hdl.handle.net/11536/136345-
dc.description.abstractIn this study, we use a semi-insulating GaAs wafer to prepare a GaMnAs thin film by Mn ion implantation and subsequent helium ion beam induced epitaxial crystallization. In addition, we use different helium energies to anneal the GaMnAs thin films. The regrown GaMnAs thin films are measured using high-resolution X-Ray diffraction, Raman scattering and spectrophotometry to analyze the crystal structures and optical properties. It is found that the GaMnAs thin films remain fully strained. All experimental results indicate that the GaMnAs thin film is formed after the ion beam induced epitaxial crystallization annealing. (C) 2016 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectDiluted magnetic semiconductorsen_US
dc.subjectGaMnAsen_US
dc.subjectIon implantationen_US
dc.subjectIon beam induced epitaxial crystallizationen_US
dc.titleStrain and optical characteristics study of ferromagnetic GaMnAs fabricated by ion beam induced epitaxial crystallizationen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.surfcoat.2016.05.019en_US
dc.identifier.journalSURFACE & COATINGS TECHNOLOGYen_US
dc.citation.volume306en_US
dc.citation.spage92en_US
dc.citation.epage96en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000387526200019en_US
dc.citation.woscount0en_US
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