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dc.contributor.author余水陽zh_TW
dc.contributor.authorS.Y.Yuen_US
dc.date.accessioned2017-10-06T06:22:48Z-
dc.date.available2017-10-06T06:22:48Z-
dc.date.issued1977-09en_US
dc.identifier.urihttp://hdl.handle.net/11536/137591-
dc.description.abstractThe current-voltage characteristics of the p+n1n2p+ reach-through BARITT diode has been derived over the entire current range, by combining the thermionic injection effect at the injection junction and the space charge effect in the drift region. The characteristics are calculated for various doping densities ND1 and thicknesses Xs of the n1 layer. At low current injection levels, the current has the thermionic emission form, that is J~A*T^2exp((VFB2+VFB1(2?/X2*1)*V)^2/4VTVFB);at hogher current levels, the current has the space charge limited form, that is J~V.The d.c. conductance of both the p+n1n2p+ and the p+n2p+ structures are compared, and it is found that the slope of the J-V curve forthe p+n2p+structure is greater by the factor (ND1/ND2)^1/2 than that for the p+n1n2p+ structureen_US
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.title雙飄層構造抵穿能障二極體之電流——電壓特性zh_TW
dc.titleThe Current-Voltage Characteristics of the Reach-Through BARITT Diode with Double Drift Layer Structureen_US
dc.typeCampus Publicationsen_US
dc.identifier.journal交通大學學報zh_TW
dc.identifier.journalThe Journal of National Chiao Tung Universityen_US
dc.citation.volume3en_US
dc.citation.spage43en_US
dc.citation.epage=O63-1en_US
顯示於類別:交通大學學報


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