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dc.contributor.authorSu, Pen_US
dc.contributor.authorLee, Wen_US
dc.date.accessioned2014-12-08T15:19:23Z-
dc.date.available2014-12-08T15:19:23Z-
dc.date.issued2005-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.2366en_US
dc.identifier.urihttp://hdl.handle.net/11536/13842-
dc.description.abstractThis paper presents a compact silicon-on-insulator (SOI) model to capture the geometry-dependent floating-body effect using the body-source built-in potential lowering approach. This physically accurate model circumvents the modeling challenge imposed by the trend of the coexistence of partial-depletion (PD) and full-depletion (FD) devices in a single SOI chip by considering short-channel, reverse short-channel and reverse narrow-width floating-body effects. The implication on circuit simulation, under the unified Berkeley short-channel IGFET model-silicon-on-insulator (BSIMSOI) framework, has also been addressed. This geometry-dependent body-source built-in potential lowering model will further enhance the device design of scaled SOI complementary metal-oxide-semiconductor (CMOS) below 100 nm.en_US
dc.language.isoen_USen_US
dc.subjectfloating-body effecten_US
dc.subjectbody-source built-in potential loweringen_US
dc.subjectSOICMOSen_US
dc.subjectcircuit simulationen_US
dc.titleModeling geometry-dependent floating-body effect using body-source built-in potential lowering for SOI circuit simulationen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.44.2366en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume44en_US
dc.citation.issue4Ben_US
dc.citation.spage2366en_US
dc.citation.epage2370en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000229095700057-
dc.citation.woscount0-
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