標題: Improvement in instable analysis of heat inflation induced line-width after replacing pellicle with diamond film on reticle (photo-masks)
作者: Kuo, YK
Chao, CG
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-Apr-2005
摘要: A new reticle is designed that takes advantage of the high value of thermal conductivity of diamond to add a layer of diamond film to the bottom of traditional pellicle-reticle; that is, the new reticle replaces the pellicle with a diamond material. This method may help maintain the future manufacturing process of photo-lithography below 35 nm and can improve the problem of slightly out of shape reticle caused by the long-term effects of light and thermal energy. (c) 2004 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2004.11.013
http://hdl.handle.net/11536/13880
ISSN: 0167-9317
DOI: 10.1016/j.mee.2004.11.013
期刊: MICROELECTRONIC ENGINEERING
Volume: 77
Issue: 3-4
起始頁: 297
結束頁: 301
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