背通道蝕刻型氧化銦鎢鋅薄膜電晶體技術之研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	張維晟	zh_TW
dc.contributor.author	劉柏村	zh_TW
dc.contributor.author	謝漢萍	zh_TW
dc.contributor.author	Chang Wei-Cheng	en_US
dc.contributor.author	Liu, Po-Tsun	en_US
dc.contributor.author	Shieh, Han-Ping	en_US
dc.date.accessioned	2018-01-24T07:38:23Z	-
dc.date.available	2018-01-24T07:38:23Z	-
dc.date.issued	2016	en_US
dc.identifier.uri	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070350565	en_US
dc.identifier.uri	http://hdl.handle.net/11536/139794	-
dc.language.iso	en_US	en_US
dc.subject	薄膜電晶體	zh_TW
dc.subject	背通道蝕刻	zh_TW
dc.subject	氧化銦鎢鋅	zh_TW
dc.subject	thin film transister	en_US
dc.subject	back channel etched	en_US
dc.subject	IWZO	en_US
dc.title	背通道蝕刻型氧化銦鎢鋅薄膜電晶體技術之研究	zh_TW
dc.title	Study on Back-Channel Etched of In-W-Zn-O Thin Film Transistors Technology	en_US
dc.type	Thesis	en_US
dc.contributor.department	光電工程研究所	zh_TW
顯示於類別：	畢業論文