以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜

標題:	以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜 The fabrication and characterization of hydrogen doped indium oxide by RF-sputter method
作者:	王義智吳耀銓 Wang,Yi-Chih Wu, Yew-Chung 工學院半導體材料與製程設備學程
關鍵字:	以射頻磁控濺鍍氣相沉積法製備參氫的氧化銦薄膜;The fabrication and characterization of hydrogen doped indium oxide by RF-sputter method
公開日期:	2016
URI:	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070161324 http://hdl.handle.net/11536/143305
Appears in Collections:	Thesis