標題: Lithography-free thin-titanium-nanocone metamaterial perfect absorbers using ZnO nanostructures
作者: Lin, Albert
Parashar, Parag
Yang, Chih-Chieh
Jian, Ding Rung
Huang, Wei-Ming
Huang, Yi-Wen
Tseng, Tseung-Yuen
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-十月-2017
摘要: In this work, thin Ti nanocones are deposited on top of the arrays of ZnO nanopagodas, and the whole structure works as an efficient nanostructured metamaterial perfect absorber (MPA) without using lithography and dry etching. In this design, similar to 1 mu m long ZnO nanopagoda arrays are grown on a 100 nm ZnO buffer layer over the silicon/glass substrate by a treatment with an aqueous solution of L-ascorbic acid. Growth direction and the degree of lamination in the ZnO nanostructures can be easily controlled by adjusting the concentration of L-ascorbic acid. Afterward, these ZnO nanopagodas are coated with a 30nm thin top and a 500nm thick bottom layer of Ti to achieve the proposed nanocone resonant cavity structure with electromagnetic wave field penetration. The overall structure encapsulates three physical concepts, namely, field penetration, adiabatic coupling and cavity resonance, which contribute the broadband perfect absorption. The entire process is carried out at a low temperature (< 90 degrees). We believe the proposed tapered Ti nanocones MPA structure facilitates ultra-broadband perfect spectral absorption with promising nature of low-cost, large-area, and lithography-free. (C) 2017 Optical Society of America
URI: http://dx.doi.org/10.1364/OME.7.003608
http://hdl.handle.net/11536/143852
ISSN: 2159-3930
DOI: 10.1364/OME.7.003608
期刊: OPTICAL MATERIALS EXPRESS
Volume: 7
Issue: 10
起始頁: 3608
結束頁: 3617
顯示於類別:期刊論文


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