完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Cheng, Chun-Hu | en_US |
dc.contributor.author | Chiu, Yu-Chien | en_US |
dc.contributor.author | Liou, Guan-Lin | en_US |
dc.date.accessioned | 2018-08-21T05:52:41Z | - |
dc.date.available | 2018-08-21T05:52:41Z | - |
dc.date.issued | 2017-10-01 | en_US |
dc.identifier.issn | 1862-6254 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1002/pssr.201700098 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/143870 | - |
dc.description.abstract | In this work, we investigated the negative capacitance behavior of novel ferroelectric versatile memory with low-voltage-driven and fast ferroelectric switching. The combined storage mechanism strengthened the stability of ferroelectric polarization by interface aligned dipoles. The simulation results of first principle calculation indicated that the monoclinic-like orthorhombic phase of ferroelectric hafnium oxide facilitated the occurrence of S-shaped negative capacitance behavior. Furthermore, the control of phase transition may affect ferroelectric property and negative capacitance effect during program and erase states. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | ferroelectrics | en_US |
dc.subject | HfZrO | en_US |
dc.subject | negative capacitance | en_US |
dc.subject | orthorhombic | en_US |
dc.title | Experimental Observation of Negative Capacitance Switching Behavior in One-Transistor Ferroelectric Versatile Memory | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1002/pssr.201700098 | en_US |
dc.identifier.journal | PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | en_US |
dc.citation.volume | 11 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000412162000012 | en_US |
顯示於類別: | 期刊論文 |