標題: | Selective Deposition of Multiple Sensing Materials on Si Nanobelt Devices through Plasma-Enhanced Chemical Vapor Deposition and Device-Localized Joule Heating |
作者: | Lin, Ru-Zheng Cheng, Kuang-Yang Pan, Fu-Ming Sheu, Jeng-Tzong 材料科學與工程學系奈米科技碩博班 分子醫學與生物工程研究所 Graduate Program of Nanotechnology , Department of Materials Science and Engineering Institute of Molecular Medicine and Bioengineering |
關鍵字: | silicon nanobelt;localized Joule heating;plasma-enhanced atomic layer deposition;plasma-enhanced chemical vapor deposition;selective deposition |
公開日期: | 22-十一月-2017 |
摘要: | This paper describes a novel method, using device-localized Joule heating OH) in a plasma enhanced atomic layer deposition (PEALD) system, for the selective deposition of platinum (Pt) and zinc oxide (ZnO) in the n(-) regions of n(+)/n(-)/n(+) polysilicon nanobelts (SNBs). COMSOL simulations were adopted to estimate device temperature distribution. However, during ALD process, the resistance of SNB device decreased gradually and reached to minima after 20 min JH. As a result, thermal decomposition of precursors occurred during PEALD process. Selective deposition in the n(-) region was dominated by CVD instead of ALD. Selective deposition of Pt and ZnO films has been achieved and characterized using atomic force microscopy, scanning electron microscopy, and transmission electron microscopy. |
URI: | http://dx.doi.org/10.1021/acsami.7b13896 http://hdl.handle.net/11536/144151 |
ISSN: | 1944-8244 |
DOI: | 10.1021/acsami.7b13896 |
期刊: | ACS APPLIED MATERIALS & INTERFACES |
Volume: | 9 |
起始頁: | 39935 |
結束頁: | 39939 |
顯示於類別: | 期刊論文 |