標題: Selective Deposition of Multiple Sensing Materials on Si Nanobelt Devices through Plasma-Enhanced Chemical Vapor Deposition and Device-Localized Joule Heating
作者: Lin, Ru-Zheng
Cheng, Kuang-Yang
Pan, Fu-Ming
Sheu, Jeng-Tzong
材料科學與工程學系奈米科技碩博班
分子醫學與生物工程研究所
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
Institute of Molecular Medicine and Bioengineering
關鍵字: silicon nanobelt;localized Joule heating;plasma-enhanced atomic layer deposition;plasma-enhanced chemical vapor deposition;selective deposition
公開日期: 22-Nov-2017
摘要: This paper describes a novel method, using device-localized Joule heating OH) in a plasma enhanced atomic layer deposition (PEALD) system, for the selective deposition of platinum (Pt) and zinc oxide (ZnO) in the n(-) regions of n(+)/n(-)/n(+) polysilicon nanobelts (SNBs). COMSOL simulations were adopted to estimate device temperature distribution. However, during ALD process, the resistance of SNB device decreased gradually and reached to minima after 20 min JH. As a result, thermal decomposition of precursors occurred during PEALD process. Selective deposition in the n(-) region was dominated by CVD instead of ALD. Selective deposition of Pt and ZnO films has been achieved and characterized using atomic force microscopy, scanning electron microscopy, and transmission electron microscopy.
URI: http://dx.doi.org/10.1021/acsami.7b13896
http://hdl.handle.net/11536/144151
ISSN: 1944-8244
DOI: 10.1021/acsami.7b13896
期刊: ACS APPLIED MATERIALS & INTERFACES
Volume: 9
起始頁: 39935
結束頁: 39939
Appears in Collections:Articles