標題: Growth competition between layer-type and porous-type Cu3Sn in microbumps
作者: Chu, David T.
Chu, Yi-Cheng
Lin, Jie-An
Chen, Yi-Ting
Wang, Chun-Chieh
Song, Yen-Fang
Chiang, Cheng-Cheng
Chen, Chih
Tu, K. N.
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Porous structure;Microbumps;Intermetallic compounds;Growth competition
公開日期: 1-十二月-2017
摘要: Experimental study of growth competition between the co-existing layer-type and porous-type Cu3Sn in solder microbumps of Cu/SnAg/Cu is reported. The thickness of the SnAg solder is about 14 pm and the Cu column on both sides is 20 pm. Upon wetting-reflow, the solder is reacted completely to form Cu Sn iptermetallic compounds in a multi-layered structure of Cu/Cu3Sn/Cu6Sn5/Cu3Sn/Cu. Upon further annealing at 220 degrees C and 260 C, we obtain Cu/Cu3Sn/porous Cu3Sn/Cu3Sn/Cu, in which both types of Cu3Sn co-exist and form an interface. In the layer-type growth, we assume Cu to be the dominant diffusing species, coming from the Cu column. The Cu reacts with Cu6Sn5 to grow the Cu3Sn layer. In the porous-type growth, we assume Sn to be the dominant diffusing species, coming from the depletion of Sn in Cu6Sn5. The depleted Cu6Sn5 transforms to the porous-type Cu3Sn. At the same time, the Sn diffuses to the side-wall of Cu column to form a coating of Cu3Sn. Experimental observations of 3-dimensional distribution of voids in the porous-type Cu3Sn are performed by synchrotron radiation tomography; the voids are interconnected for the out-diffusion of Sn. The competing growth between the layer-type and the porous-type Cu3Sn is analyzed. (C) 2017 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.microrel.2017.10.001
http://hdl.handle.net/11536/144217
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2017.10.001
期刊: MICROELECTRONICS RELIABILITY
Volume: 79
起始頁: 32
結束頁: 37
顯示於類別:期刊論文