標題: | Growth competition between layer-type and porous-type Cu3Sn in microbumps |
作者: | Chu, David T. Chu, Yi-Cheng Lin, Jie-An Chen, Yi-Ting Wang, Chun-Chieh Song, Yen-Fang Chiang, Cheng-Cheng Chen, Chih Tu, K. N. 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Porous structure;Microbumps;Intermetallic compounds;Growth competition |
公開日期: | 1-十二月-2017 |
摘要: | Experimental study of growth competition between the co-existing layer-type and porous-type Cu3Sn in solder microbumps of Cu/SnAg/Cu is reported. The thickness of the SnAg solder is about 14 pm and the Cu column on both sides is 20 pm. Upon wetting-reflow, the solder is reacted completely to form Cu Sn iptermetallic compounds in a multi-layered structure of Cu/Cu3Sn/Cu6Sn5/Cu3Sn/Cu. Upon further annealing at 220 degrees C and 260 C, we obtain Cu/Cu3Sn/porous Cu3Sn/Cu3Sn/Cu, in which both types of Cu3Sn co-exist and form an interface. In the layer-type growth, we assume Cu to be the dominant diffusing species, coming from the Cu column. The Cu reacts with Cu6Sn5 to grow the Cu3Sn layer. In the porous-type growth, we assume Sn to be the dominant diffusing species, coming from the depletion of Sn in Cu6Sn5. The depleted Cu6Sn5 transforms to the porous-type Cu3Sn. At the same time, the Sn diffuses to the side-wall of Cu column to form a coating of Cu3Sn. Experimental observations of 3-dimensional distribution of voids in the porous-type Cu3Sn are performed by synchrotron radiation tomography; the voids are interconnected for the out-diffusion of Sn. The competing growth between the layer-type and the porous-type Cu3Sn is analyzed. (C) 2017 Elsevier Ltd. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.microrel.2017.10.001 http://hdl.handle.net/11536/144217 |
ISSN: | 0026-2714 |
DOI: | 10.1016/j.microrel.2017.10.001 |
期刊: | MICROELECTRONICS RELIABILITY |
Volume: | 79 |
起始頁: | 32 |
結束頁: | 37 |
顯示於類別: | 期刊論文 |