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dc.contributor.authorYou, Wei-Xiangen_US
dc.contributor.authorTsai, Chih-Pengen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2018-08-21T05:53:27Z-
dc.date.available2018-08-21T05:53:27Z-
dc.date.issued2018-04-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2018.2805716en_US
dc.identifier.urihttp://hdl.handle.net/11536/144702-
dc.description.abstractThrough numerical simulations corroborated by an analytical subthreshold model considering drain coupling, this paper systematically investigates the short-channel effects in negative-capacitance FETs with 2D MoS2 channel (2D-NCFET). Our study indicates that, due to the impact of drain coupling on the negative-capacitance effect, the 2D-NCFET exhibits distinct short-channel behaviors such as improved average subthreshold swing and threshold-voltage roll-up with decreasing gate length. In addition, the fringe field through the high-k interlayer dielectric can significantly alter the subthreshold characteristics of the short-channel 2D-NCFET, and henceneeds to be carefully taken into account. Our studymay provide insights for device design using negative-capacitance FETs.en_US
dc.language.isoen_USen_US
dc.subject2D semiconductorsen_US
dc.subjectferroelectric FETen_US
dc.subjecthigh-k gate dielectricsen_US
dc.subjectLandau-Khalatnikov(L-K) equationen_US
dc.subjectnegative-capacitance field-effect transistor (NCFET)en_US
dc.subjectshort-channel effectsen_US
dc.subjectsubthreshold modelen_US
dc.subjecttransition-metal-dichalcogenide (TMD)en_US
dc.titleShort-Channel Effects in 2D Negative-Capacitance Field-Effect Transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2018.2805716en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume65en_US
dc.citation.spage1604en_US
dc.citation.epage1610en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000427856300050en_US
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