標題: Determining thickness of films on a curved substrate by use of ellipsometric measurement
作者: Han, Chien-Yuan
Lee, Zhen-You
Chao, Yu-Faye
光電工程學系
Department of Photonics
關鍵字: imaging ellipsometry;thin film thickness;curved surface
公開日期: 1-Jan-2008
摘要: The three intensity polarizer-sample-analyzer imaging ellipsometry is used to measure the ellipsometric parameters (Psi, Delta). In addition to the ellipsometric parameters, we introduce an extra angle alpha to measure the of the azimuth deviation of polarizer. After careful calibration, we found this deviation can indicate how much the surface normal slanted from the plane; then it can be used to deduce the thickness profile coated on a cylindrical lens. Using this technique, we. not only can determine the radius curvature of the curved surface, we also can calculate the thickness of the thin film coated on a curved surface.
URI: http://dx.doi.org/10.1117/12.794178
http://hdl.handle.net/11536/146216
ISBN: 978-0-8194-7285-4
ISSN: 0277-786X
DOI: 10.1117/12.794178
期刊: REFLECTION, SCATTERING, AND DIFFRACTION FROM SURFACES
Volume: 7065
起始頁: 0
結束頁: 0
Appears in Collections:Conferences Paper


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