标题: In-situ Observation of the Failure Induced by Thermomigration of Interstitial Cu in Pb-free Flip Chip Solder Joints
作者: Chen, Hsiao-Yun
Chen, Chih
材料科学与工程学系
Department of Materials Science and Engineering
公开日期: 2009
摘要: Thermomigration in Pb-free SnAg solder joints is investigated during accelerated electromigration tests under 9.7 x 103 A/cm(2) at 150 degrees C. Different from Pb-containing solders, it is found that Cu-Sn intermetallic compounds (IMCs) migrate toward the cold end on the substrate end and thus voids accumulate in the passivation opening for the bump with current flowing from the substrate end to the chip end. Theoretical calculation indicates that the thermomigration force is greater than the electromigration force at a thermal gradient above 400 degrees C/cm. Copper atoms may migrate against current flow and become the dominant diffusion species. Also, the Q* can be estimated around I I kJ/mole. On the other hand, a control experiment shows that Ni-Sn IMCs did not migrate even tinder a huge thermal gradient over 1400 degrees C/cm.
URI: http://hdl.handle.net/11536/14710
ISBN: 978-1-4244-4475-5
期刊: 2009 IEEE 59TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, VOLS 1-4
起始页: 319
结束页: 324
显示于类别:Conferences Paper