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dc.contributor.authorChiang, Chunen_US
dc.contributor.authorChang, Ping-Chenen_US
dc.contributor.authorChao, Mei-Lingen_US
dc.contributor.authorTang, Tien-Haoen_US
dc.contributor.authorSu, Kuan-Chengen_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2018-08-21T05:57:09Z-
dc.date.available2018-08-21T05:57:09Z-
dc.date.issued2017-01-01en_US
dc.identifier.issn1946-1550en_US
dc.identifier.urihttp://hdl.handle.net/11536/147120-
dc.description.abstractAccording to previous work about PESD optimization [1], there are some potential risks such as low breakdown voltage (V-BD) and low holding voltage (V-h) can be improved for power-rail ESD application. Through drain region design with P-type concentration engineering, the enclosed P-Well in Deep N-Well (EW) in drain region was proposed with high ESD performance (HBM>8kV) and good turn-on efficiency (V-t1=8.1V) without suffering from low V-BD and latch-up issues.en_US
dc.language.isoen_USen_US
dc.titleLow-Trigger ESD Protection Design with Latch-Up Immunity for 5-V CMOS Application by Drain Engineeringen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2017 IEEE 24TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL AND FAILURE ANALYSIS OF INTEGRATED CIRCUITS (IPFA)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000426989100171en_US
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