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dc.contributor.authorCheng, Chia-Chuen_US
dc.contributor.authorWu, Chu-Chunen_US
dc.contributor.authorFan, Yen-Tingen_US
dc.contributor.authorWu, Jenq-Shinnen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.date.accessioned2019-04-02T06:00:22Z-
dc.date.available2019-04-02T06:00:22Z-
dc.date.issued2018-09-01en_US
dc.identifier.issn2158-3226en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5040382en_US
dc.identifier.urihttp://hdl.handle.net/11536/148233-
dc.description.abstractHeterogeneous epitaxial growth between semiconductors and metals boosts novel device development and enables various applications. In this work, we have investigated the epitaxial growth of GaAs layers on top of a nanoscale aluminium-transformed AlAs film. The grown GaAs layers are single-crystalline and of highquality, that has been evidenced by using various material characterization methods and by fabricating their high-electron mobility transistors. We found that an intriguing process named as "arsenidation" of aluminium film plays a key role in the successful epitaxy. Our work opens a window for growing semiconductor/metal hetero-structures for various device applications in the future. (C) 2018 Author(s).en_US
dc.language.isoen_USen_US
dc.titleEpitaxial GaAs and pHEMT on aluminum-transformed AlAs nanofilmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5040382en_US
dc.identifier.journalAIP ADVANCESen_US
dc.citation.volume8en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000446058000029en_US
dc.citation.woscount0en_US
Appears in Collections:Articles