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dc.contributor.authorAluguri, R.en_US
dc.contributor.authorSailesh, R.en_US
dc.contributor.authorKumar, D.en_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2019-04-02T05:59:08Z-
dc.date.available2019-04-02T05:59:08Z-
dc.date.issued2019-01-25en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/1361-6528/aae670en_US
dc.identifier.urihttp://hdl.handle.net/11536/148494-
dc.description.abstractThe characteristics of ITO/Eu2O3/ITO/PET transparent and flexible resistive switching memory are studied. The device exhibits superior characteristics such as device area-independent and forming-free resistive switching behavior with a resistance on/off ratio of 10(4), good retention of >10(4) s and high AC endurance of >10(7) cycles. The conduction mechanism of the high-resistance state is the Poole-Frenkel mechanism, while that of the low-resistance state is ohmic conduction. The electrical characteristics of the flexible device have shown excellent results up to 5 mm bending radius, at which a degradation in the on/off ratio of the memory window is observed, due to the change in the dielectric layer resistance. The resistive switching characteristics can be improved during bending up to the radius of 2 mm by the incorporation of an aluminum-doped zinc oxide layer in the device as the bottom electrode, proving its application in future flexible and transparent memory devices.en_US
dc.language.isoen_USen_US
dc.subjectflexible and transparent RRAMen_US
dc.subjectPoole-Frenkel conductionen_US
dc.subjecthigh on/off ratioen_US
dc.subjectbendingen_US
dc.titleCharacteristics of flexible and transparent Eu2O3 resistive switching memory at high bending conditionen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/1361-6528/aae670en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume30en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000450982800001en_US
dc.citation.woscount0en_US
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