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dc.contributor.authorKakkerla, Ramesh Kumaren_US
dc.contributor.authorAnandan, Deepaken_US
dc.contributor.authorSingh, Sankalp Kumaren_US
dc.contributor.authorYu, Hung Weien_US
dc.contributor.authorLee, Ching-Tingen_US
dc.contributor.authorDee, Chang-Fuen_US
dc.contributor.authorMajlis, Burhanuddin Yeopen_US
dc.contributor.authorChang, Edward Yien_US
dc.date.accessioned2019-04-02T05:59:07Z-
dc.date.available2019-04-02T05:59:07Z-
dc.date.issued2019-01-01en_US
dc.identifier.issn1882-0778en_US
dc.identifier.urihttp://dx.doi.org/10.7567/1882-0786/aaef40en_US
dc.identifier.urihttp://hdl.handle.net/11536/148513-
dc.description.abstractIn this letter, the growth of gold-free GaSb on various InAs nanowire (NW) crystal structures using metal-organic chemical vapor deposition is demonstrated. The GaSb was grown radially and axially on wurtzite (WZ), zinc-blend (ZB) and polytype (mixture of WZ and ZB) InAs NWs. The effect of the various InAs crystal structures on GaSb was studied. This study demonstrates the control of the crystal growth of InAs and InAs/GaSb heterostructure NWs through the optimization of growth parameters and crystal transfer from core to shell, such techniques are necessary for the growth of NWs for future nanoelectronic device applications, such as TFET. (C) 2018 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleCrystal structure control of Au-free InAs and InAs/GaSb heterostucture nanowires grown on Si (111) by metal-organic chemical vapor depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/1882-0786/aaef40en_US
dc.identifier.journalAPPLIED PHYSICS EXPRESSen_US
dc.citation.volume12en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000451311100002en_US
dc.citation.woscount0en_US
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